Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Shim, Seongbo; Shin, Youngsoo

Springer International Publishing AG

04/2018

138

Dura

Inglês

9783319762937

15 a 20 dias

3554

Descrição não disponível.

Introduction.- DSAL Manufacturability.- Placement Optimization for DSAL.- Placement Optimization for MP-DSAL Compliant Layout.- Redundant Via Insertion for DSAL.

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VLSI CAD for DSA;Physical Design for DSA;DSA-Friendly VLSI Design;DSA.Aware Placement;DSA-Aware Routing;DSA-Aware Mask Optimization;DSA-Aware OPC;DSA Verification;Multi-Patterning with DSA;Inverse DSA;Nanolithography;Computational Litography